A847 Sputtersystem

The purpose of this tender is the procurement of a standalone, free-standing magnetron sputter system for polycrystalline and epitaxial magnetic thin-film materials. Key specifications of the to-be-delivered system include: Ten 2” magnetron sputter guns (7 confocal guns + 1 direct gun + 2 off-axis guns); all guns must be able to accommodate up to 0.125” thick pure iron targets; all guns must have a modular magnet design to allow balanced, unbalanced, and magnetic material configurations; must allow baking up to 200oC without disassembly; DC (750 W) and RF (300 W) power supplies that can sustain stable plasma at 1 W / 2 mTorr (DC) and at 3 W / 3 mTorr (RF); wedge shutter; 75 mm diameter substrate holder that allows rotating as well as stationary deposition at up to 850oC with temperature uniformity of < ± 1.5 % over 2” area; possibility of O2 and N2 atmosphere, even at maximum substrate temperature; combined turbo and cryo pumping; permanently installed bakeout jacket system; fully automatic multilayer deposition and offline preparation of recipes; proven CE compliance; must have service center in Europe for all repairs. We accept only bidders who can prove an extensive, satisfied base of customers who have used the offered or very similar system manufactured by the bidder for > 5 years in spintronics and complex oxide materials research.