A1015 Ar Ion Miller

Ar Ion Miller The purpose of this tender is the procurement of a standalone argon ion miller for physical etching of thin-film materials (wafers up to 2"). Typical applications include the fabrication of magnetic tunnel junctions for MRAM devices. Key specifications of the to-be-delivered system include: Motorized in-situ sample rotation and tilt; water cooling of the sample holder; a 4 cm or larger diameter ion source that operates reliably between 100 V and 1200 V; an in-situ sputter gun for protective coating of exposed side walls of the thin-film materials after milling; a vacuum system that is ready for a future upgrade with a fully retractable SIMS end point detector.